UHV-LT-SPM-MBE SYSTEM
MAIN FEATURES
MAIN FEATURES
● New Pan-type scanner with q-Plus AFM Function, modular design, easy to maintain
● Optional optical access, suitable for optical experiment
● Multi-sources MBE sample preparation, In-situ deposition
● Compact Load-Lock chamber, fast sample transfer
● New Pan-type scanner with q-Plus AFM Function, modular design, easy to maintain
● Optional optical access, suitable for optical experiment
● Multi-sources MBE sample preparation, In-situ deposition
● Compact Load-Lock chamber, fast sample transfer
STM TEST DATA

STM TEST DATA

TECHNICAL DATA
TECHNICAL DATA
Scanner | Optical compatible | |
Modular design with optional q-Plus AFM Function | ||
Lowest Operational temperature | ≤5K | |
X/Y/Z Coarse movement | 2×2×8mm | |
X/Y/Z Scan Range | 6×6×2μm @ RT | |
1.5×1.5×0.5μm @ LHe | ||
LHe holding time | ≥50h(Cryostat bath capacity: 4L LHe, 15L LN2) |
|
Temperature Drift | <0.2nm/h | |
Resolution | Atomic resolution | |
Manipulator | X/Y Axis | ±12.5mm manually actuated |
Z Axis | 450mm stepper motorized | |
Primary (polar) rotation | ±180° manually actuated | |
Secondary (azimuthal) rotation | ±180° manually actuated | |
Temperature range | 120K~RT (LN2 cooling) | |
RT~1450K(E-Beam heating) | ||
Evaporators (up to 6) |
DN40CF (O.D. 2.75'') | Qty:5 |
DN63CF (O.D. 4.5'') | Qty:1 | |
Options | Optical access, suitable for optical experiment | |
RHEED | ||
LEED | ||
Ion Gun(3KeV/5KeV) |
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