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Nexalayer™-8″ ALD/PEALD Syetem
原子层沉积系统
Product Description
MAIN FEATURES
MAIN FEATURES
● UHV-compatible integration (e.g., XPS, MBE) for in-situ processing and analysis.
● Up to 8 solid/liquid precursors, 2 oxidizing/reducing gas lines, and 3 carrier gas lines for complex thin film processes.
● Precise temperature control (±1 °C) with fuzzy logic self-tuning for high reproducibility and film quality.
● Fully automated control system with user-defined programming for flexible ALD process development.
● Integrated safety interlocks and alarm system for reliable and safe operation.
● Comprehensive process logging for full traceability.
● UHV-compatible integration (e.g., XPS, MBE) for in-situ processing and analysis.
● Up to 8 solid/liquid precursors, 2 oxidizing/reducing gas lines, and 3 carrier gas lines for complex thin film processes.
● Precise temperature control (±1 °C) with fuzzy logic self-tuning for high reproducibility and film quality.
● Fully automated control system with user-defined programming for flexible ALD process development.
● Integrated safety interlocks and alarm system for reliable and safe operation.
● Comprehensive process logging for full traceability.
ALD TEST DATA
ALD TEST DATA
TECHNICAL DATA
TECHNICAL DATA
| Main Chamber | Material | 316SS | ||
| Operating Temperature | RT~400℃ | |||
| Substrate | Up to 8-inch wafer | |||
| Temperature control accuracy | ±1℃ | |||
| Precursors Delivery | 4 Low temperature precursors (RT~100℃) | (CH3)3Al, (CH3)3Ge, H2O etc. | ||
| 4 High temperature precursors (RT~300℃) | Fe(Cp)2, Precious metal precursors | |||
| Temperature control accuracy | ±1℃ | |||
| Gas Flow Control | 5 Gas flow controllers, 0-500 sccm | |||
| Carrier Gas | N2, Ar | |||
| Reaction Gas | O2/O3，H2 | |||
| Film Uniformity | ≤1% (Al₂ O₃ , 5-point average, edge exclusion: 5 mm) | |||
| Temperature Control Channels | Up to 48 channels (±1 °C) | |||
| Valve Control Channels | Up to 24 channels (control accuracy: 15 ms) | |||
| Control System | Main processing unit, heating control unit, temperature control unit | |||
| Software Control | LabVIEW graphical design, PID temperature control with fuzzy algorithm auto tuning function, Programmable and Vacuum interlock function |
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| Options | Residual gas analysis module | |||
| Plasma module | ||||
| QCM for in-situ gas composition analysis | ||||
| Ellipsometer optical detection module | ||||
| FTIR spectrum in-situ detection module | ||||
Related Documents / DOWNLOAD
Related Products
ACME (Beijing) Technology
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No. Jia 25, Yanqi South 4th Street, Yanqi Economic Development Area, Huairou District, Beijing 101407, China
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