E-beam Evaporator

电子束蒸发源

Product Description

MAIN FEATURES

●UHV Compatible

●Evaporation temperature over 3000℃

●Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design

●Integrated shutter, fully open without space limitation

●Reliable flux monitor with external field shielding

●Easy and fast material reloading

● UHV Compatible

● Evaporation temperature over 3000℃

● Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design

● Integrated shutter, fully open without space limitation

● Reliable flux monitor with external field shielding

● Easy and fast material reloading

MAIN APPLICATIONS

● Surface Science ● Ultra-thin films ● Multilayers

● Doping ● Sample Preparation ● Contact Metallization

MAIN APPLICATIONS

● Surface Science

● Ultra-thin films

● Multilayers

● Doping

● Sample Preparation

● Contact Metallization

Part Number Composition

② 35 : DN40CF ⑥ Available options P : Pneumatic, M：Manual

Part Number Composition

② Available option 35 : DN40CF ⑥ Available options P : Pneumatic, M：Manual

TECHNICAL DATA

Mounting Flange	DN40CF (O.D. 2.75'')
Bakeout Temperature	200℃
In Vacuum Diameter	34mm
In Vacuum Length	210 mm standard, 190mm~400mm optional
Number of Pockets	1
Sample Type	rod/pellet/powder (crucible available)
Cooling Method	Internal water cooling, 1L/min
Flux Monitoring Range	0.1nA~1mA
Filament Current	0~7A (10mA step)
Acceleration Voltage	0~2000V
Max Power	250W
Beam Divergence	±6°
Evaporating Temperature	≥3000℃
Crucible Size	0.1cc
Crucible Material	W/ Mo/Ta/ Graphite/Other material upon request
Rod Size	2~4 mm Dia., 30~60mm Length

Related Documents / DOWNLOAD

E-beam Evaporator