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Epitara™-2'' MBE Systems
MBE system for substrates up to 2 inches

Product Description

  MAIN FEATURES

 

  MAIN FEATURES

 

● Modular design with flexible configuration of core functional modules, enabling complex multi-step processes and precise alignment with diverse experimental objectives.

● Highly integrated design with a compact footprint, balancing performance and space efficiency, suitable for a wide range of experimental applications.

● Compatible with high-capacity electron beam evaporation sources to support diverse sample preparation requirements.

● Expandable architecture enabling seamless integration with other ultra-high vacuum (UHV) systems.

● Integrated control system with program presetting, simplifying operation while improving reliability and reproducibility.

● Modular design with flexible configuration of core functional modules, enabling complex multi-step processes and precise alignment with diverse experimental objectives

● Highly integrated design with a compact footprint, balancing performance and space efficiency, suitable for a wide range of experimental applications.

● Compatible with high-capacity electron beam evaporation sources to support diverse sample preparation requirements.

● Expandable architecture enabling seamless integration with other ultra-high vacuum (UHV) systems.

● Integrated control system with program presetting, simplifying operation while improving reliability and reproducibility.

  TECHNICAL DATA

 

  TECHNICAL DATA

 

 

Growth Chamber Ultimate Vacuum Better than 7×10-11mbar
Chamber Diameter O.D.400mm(customizable)
Cold Shield & Shutter Optional
Source Ports CF35×6,CF35×4(customizable)
Bakeout Temperature max150℃
Manipulator Substrate Compatibility Up to 2-inch wafer
Shutter Drive Method Electric / pneumatic
Heating Method Radiative heating
Temperature Range

RT ‒ 1000 °C (Type-K thermocouple)

Load Lock Chamber Ultimate Vacuum Better than 5×10-8mbar
Sample Capacity ≥ 6 samples
Bakeout Temperature max150℃
Transfer Method Manual
Control System Basic Configuration (Optional) Integrated Vacuum Control Unit
Manual valve operation
Standard Configuration (Optional) Touchscreen control panel
Data logging
Manipulator control
System log management
Automated valve control
Recipe-based growth software (optional)
Opitons Preparation Chamber Ultimate Vacuum Better than 7 × 10-10mbar
Bakeout Temperature  max150℃

Reserved Ports

Sample manipulator (CF100×1)

Ar/H Sputtering(CF35×2)

LEED(CF150×1)

Viewport(CF63×1+CF35×1)

In-situ Monitoring RGA
QCM
BFM
LEED
RHEED

 

 

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