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Epitara™-4'' MBE Systems

MBE system for substrates up to 4 inches

Product Description

MAIN FEATURES

● Designed for medium- to large-size substrates, supporting diverse experimental requirements from fundamental research to pilot-scale production.

● Space-optimized design ensuring efficient operation and future upgrade capability, facilitating laboratory layout, installation, and maintenance.

● Compatible with high-capacity electron beam evaporation sources to meet diverse sample preparation requirements.

● Strong scalability, enabling interconnection with other ultra-high vacuum (UHV) systems.

● Integrated control system with program presetting, reducing operational complexity and improving experimental reliability and reproducibility.

● Designed for medium- to large-size substrates, supporting diverse experimental requirements from fundamental research to pilot-scale production.

● Space-optimized design ensuring efficient operation and future upgrade capability, facilitating laboratory layout, installation, and maintenance.

● Compatible with high-capacity electron beam evaporation sources to meet diverse sample preparation requirements.

● Strong scalability, enabling interconnection with other ultra-high vacuum (UHV) systems.

● Integrated control system with program presetting, reducing operational complexity and improving experimental reliability and reproducibility.

TECHNICAL DATA

Growth Chamber	Ultimate Vacuum		Better than 7×10^-11mbar
	Chamber Diameter		O.D. 550 mm (customizable)
	Cold Shield & Shutter		Standard
	Source Shutter Type & Drive Method		Integrated / independent, pneumatic / manual
	Source Ports		CF63×4+CF100×6/CF63×4+CF100×4+CF250×1(customizable)
	Bakeout Temperature		max150℃
	Manipulator	Substrate Compatibility	Up to 4-inch wafer
		Shutter Drive Method	Electric / pneumatic
		Heating Method	Radiative heating
		Temperature Range	RT ‒ 1000 °C (Type-K thermocouple)
Preparation Chamber	Ultimate Vacuum		Better than 5×10^-10mbar
	Bakeout Temperature		max150℃
	Reserved Ports		Sample manipulator （CF200×1） Ar/H Sputtering（CF35×2） LEED（CF150×1） Viewport（CF100×1+CF35×1）
Load Lock Chamber	Ultimate Vacuum		Better than 5×10^-8mbar
	Sample Capacity		≥ 5 samples
	Bakeout Temperature		max150℃
	Transfer Method		Manual
Control System	Standard Configuration		Touchscreen control panel
			Data logging
			Manipulator control
			Bakeout control
			System log & management
			Automated valve control
	Optional Configuration		Recipe-based growth software
Opitons	Buffer Chamber		Ultimate Vacuum	Better than 7 × 10^-10mbar
			Bakeout Temperature	max150℃
			Reserved Ports	Sample transporter（CF200×1） Viewport（CF100×1）
	In-situ Monitoring		RGA
			QCM
			BFM
			LEED
			RHEED

Related Documents / DOWNLOAD

Epitara-4‘’ MBE System