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E-beam Evaporator

E-beam Evaporator

电子束蒸发源
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Description

  MAIN FEATURES

 

  MAIN FEATURES

 

●UHV Compatible

●Evaporation temperature over 3000℃

●Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design

●Integrated shutter, fully open without space limitation

●Reliable flux monitor with external field shielding

●Easy and fast material reloading

● UHV Compatible

● Evaporation temperature over 3000℃

● Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design

● Integrated shutter, fully open without space limitation

● Reliable flux monitor with external field shielding

● Easy and fast material reloading

  MAIN APPLICATIONS

 

● Surface Science        ● Ultra-thin films        ● Multilayers

● Doping              ● Sample Preparation        ● Contact Metallization

  MAIN APPLICATIONS

 

● Surface Science

● Ultra-thin films        

● Multilayers

● Doping

● Sample Preparation

● Contact Metallization

  Part Number Composition

 

② Available option 35 : DN40CF     ⑥ Available options P : Pneumatic, M:Manual

  Part Number Composition

 

② Available option 35 : DN40CF     ⑥ Available options P : Pneumatic, M:Manual

  TECHNICAL DATA

 

  TECHNICAL DATA

 

 

 

Mounting Flange DN40CF (O.D. 2.75'')
Bakeout Temperature 200℃
In Vacuum Diameter 34mm
In Vacuum Length 210 mm standard, 170mm~400mm optional
Number of Pockets 1
Sample Type rod/pellet/powder (crucible available)
Cooling Method Internal water cooling, 1L/min
Flux Monitoring Range 0.1nA~1mA
Filament Current 0~7A (10mA step)
Acceleration Voltage 0~2000V
Max Power 250W
Beam Divergence ±6°
Evaporating Temperature ≥3000℃
Crucible Size 0.1cc, 0.15cc
Crucible Material W/ Mo/Ta/ Graphite/Other material upon request
Rod Size 1~4 mm Dia., 20~100mm Length
We could not find any corresponding parameters, please add them to the properties table
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Number of views:
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E-beam Evaporator

电子束蒸发源
Retail price
0.0
Market price
0.0
Number of views:
0
Product serial number
Category
Components
Quantity
-
+
1
Description

  MAIN FEATURES

 

  MAIN FEATURES

 

●UHV Compatible

●Evaporation temperature over 3000℃

●Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design

●Integrated shutter, fully open without space limitation

●Reliable flux monitor with external field shielding

●Easy and fast material reloading

● UHV Compatible

● Evaporation temperature over 3000℃

● Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design

● Integrated shutter, fully open without space limitation

● Reliable flux monitor with external field shielding

● Easy and fast material reloading

  MAIN APPLICATIONS

 

● Surface Science        ● Ultra-thin films        ● Multilayers

● Doping              ● Sample Preparation        ● Contact Metallization

  MAIN APPLICATIONS

 

● Surface Science

● Ultra-thin films        

● Multilayers

● Doping

● Sample Preparation

● Contact Metallization

  Part Number Composition

 

② Available option 35 : DN40CF     ⑥ Available options P : Pneumatic, M:Manual

  Part Number Composition

 

② Available option 35 : DN40CF     ⑥ Available options P : Pneumatic, M:Manual

  TECHNICAL DATA

 

  TECHNICAL DATA

 

 

 

Mounting Flange DN40CF (O.D. 2.75'')
Bakeout Temperature 200℃
In Vacuum Diameter 34mm
In Vacuum Length 210 mm standard, 170mm~400mm optional
Number of Pockets 1
Sample Type rod/pellet/powder (crucible available)
Cooling Method Internal water cooling, 1L/min
Flux Monitoring Range 0.1nA~1mA
Filament Current 0~7A (10mA step)
Acceleration Voltage 0~2000V
Max Power 250W
Beam Divergence ±6°
Evaporating Temperature ≥3000℃
Crucible Size 0.1cc, 0.15cc
Crucible Material W/ Mo/Ta/ Graphite/Other material upon request
Rod Size 1~4 mm Dia., 20~100mm Length
We could not find any corresponding parameters, please add them to the properties table
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